Tiêu chuẩn quốc tế
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Số hiệu
Standard Number
ASTM F2113-01e1
Năm ban hành 2001
Publication date
Tình trạng
W - Hết hiệu lực
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Tên tiếng Anh
Title in English Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
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Chỉ số phân loại Quốc tế (ICS)
By field
29.045 - Vật liệu bán dẫn
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Số trang
Page 2
Giá:
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Phạm vi áp dụng
Scope of standard 1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
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